Simulation Study of Capacitively Coupled Radio Frequency Silane/Hydrogen Plasma Discharges – Effect of Tailored Voltage Waveforms

Wei Huang^1*

¹工程與系統科學系, 國立清華大學, 新竹市, Taiwan

* Presenter:Wei Huang, email:aaa851124@gmail.com

Capacitively coupled plasma (CCP) sources has been widely employed for etching and deposition processes. The purpose of this study was to investigate the effect of input Tailored Voltage Waveforms (TVWs) on the plasma characteristics.

Keywords: Capacitively coupled plasma, Tailored Voltage Waveforms , Plasma