AFM-tip rubbed Gr/MoS₂ heterostructure microscopic modification of chemical and physical properties

Chak Ming Liu^1*, E.D Chu¹, Y.W Lan¹, H.C Chiu¹, W.C Lin¹

¹物理系, 國立台灣師範大學, 台北市, Taiwan

* Presenter:Chak Ming Liu, email:edward2010619@gmail.com

Due to the electrochemical process of water-graphene interaction, scanning probe lithography can be used to create graphene oxide patterns. In this study, we used a wet method to transfer graphene on MoS₂. With the coverage of graphene, the PL intensity of the few layers of MoS₂ dropped sharply by 77.9%, and a redshift occurred. In addition, the platinized tip is rubbed with the sample under different bias voltages to control the charge density. In addition, the oxidation (hydrogenation) process on Gr/MoS₂ can be controlled by rubbing the tip of the Pt coating under a negative (positive) bias. Further evidence can be observed in PL, Raman, and KPFM measurements. These results can prove the potential of the graphene/molybdenum disulfide heterostructure for the controllable tuned triboelectric properties to become a nanoscale device.

Keywords: scanning probe lithography, graphene, MoS2, oxidation, heterostructure